Source
Outline Source
The source for the data itself:
Stencil - the basic depth/stencil buffer will be used
Render Target - use a render target asset as the source of the data. Output size can be the same as the input render target or set to a specific resolution
The following are planned for a future update and may be for just editor specific functionality
Material - renders the material and creates an outline from the result
Texture - creates an outline based on the texture
Stencil Source
Stencil Indices
This is an array of indices. The maximum number you can set is 255 and the value must range from 0 to 255 as these are the only values available for the stencil buffer.
Depth Occlusion
How any scene depth occlusion should affect the result of the stencil.
Disabled - default option, scene depth occlusion is ignored
Stencil (or Inverted) - scene depth is subtracted from the stencil or if inverted, only the overlap remains and the resulting outline has no breaks
Outline (or Inverted) - subtracts from the resulting outline or if inverted, only the overlap will remain
Examples
Stencil occluded - normal (left) and inverted (right)
Outline occluded - normal (left) and inverted (right)
Render Target Source
Use Source Texture Resolution
This is a boolean that dictates whether or not the source render target's resolution should be used for the output render target's resoltuion.
Output Resolution
Allows you to set a custom output resolution. Results will be interpolated.
Source Texture
A UTextureRenderTarget2D for the outline/distance field creation process.
This is a required value.
Process Mask Texture
A UTextureRenderTarget2D, this works much like the process mask for stencil based distance field generation and provides the same kind of performance benefit.
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