Source

Outline Source

The source for the data itself:

• Stencil - the basic depth/stencil buffer will be used

• Render Target - use a render target asset as the source of the data. Output size can be the same as the input render target or set to a specific resolution

• Scene - coming in 1.3.3, this will allow the scene itself to be used as the source

The following are planned for a future update and may be for just editor specific functionality

• Material - renders the material and creates an outline from the result

• Texture - creates an outline based on the texture

Stencil Source

Only if Stencil is selected for Outline Source

Stencil Indices

This is an array of indices. The maximum number you can set is 255 and the value must range from 0 to 255 as these are the only values available for the stencil buffer.

Depth Occlusion

How any scene depth occlusion should affect the result of the stencil.

• Disabled - default option, scene depth occlusion is ignored

• Stencil (or Inverted) - scene depth is subtracted from the stencil or if inverted, only the overlap remains and the resulting outline has no breaks

• Outline (or Inverted) - subtracts from the resulting outline or if inverted, only the overlap will remain

The stencil is only modified during the outline creation process, the stencil outputted to the render target asset will contain the unmodified stencil

Examples

Stencil occluded - normal (left) and inverted (right)

Outline occluded - normal (left) and inverted (right)

Render Target Source

Only if Render Target is selected for Outline Source

Use Source Texture Resolution

This is a boolean that dictates whether or not the source render target's resolution should be used for the output render target's resolution.

Output Resolution

This only shows if Use Source Texture Resolution is set to false.

Allows you to set a custom output resolution. Results will be interpolated.

Source Texture

A UTextureRenderTarget2D for the outline/distance field creation process.

This is a required value.

Process Mask Texture

A UTextureRenderTarget2D, this works much like the process mask for stencil based distance field generation and provides the same kind of performance benefit.

This is an optional value.

Image Filter

These options will coming in 1.3.3

They will allow outlines to be created based on colour, depth, specular or world normal and will be used with both stencil and scene outline sources.

Stencil outline sources use the stencil as a mask so only the colour, depth, specular or world normal within the stencil will be used.